SEM micrographs of: (a) SiNW-15 nanostructured silicon surface using 15 s silver deposition in the first MAWCE etching step; (b) SiNW-45 nanostructured silicon surface using 45 s silver deposition in the first MAWCE etching step; (c) typical cross sectional view for MAWCE SiNWs array; (d) in-situ mechanically modified nanostructured silicon surface. (e) XANES Si L2,3 spectra for the references (from down to top) crystalline silicon c-Si, amorphous silicon a-Si, silicon suboxides SiO1.3 and SiO1.7, thermally grown 40 nm film of silicon dioxide SiO2; (f) XANES Si L2,3 registered from the initial arrays obtained under different etching time (15 and 45 sec) and their in-situ mechanically modified surface parts. Arrows indicate the presence of differently pronounced dip.
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